Sputtering相关论文
Unraveling the surface chemistry processes in lithiated and boronized plasma material interfaces und
The review of recent theoretical and experimental research on the complex surface chemistry processes that evolve from l......
CrN coated steels assisted with a nano Cr interlayer were investigated. The Cr nano-interlayers were prepared by sputter......
In order to achieve low cost high efficiency thin film solar cells,a novel Semiconductor Photovoltaic (PV) active mat......
用XPS方法研究了Ag-Pd合金在氩离子轰击下表面组成的变化。结果表明,由于Ag-Pd表面原子间结合能不同,合金在热退火后表面富Ag,经氩......
A two-step process of Ni silicide formed on bulk silicon,and the effects of different process conditions,including two-s......
ZnO films and ZnO:Cu diluted magnetic semiconductor films were prepared by radio frequency magnetron sputtering on Si(11......
Tantalum and copper layers were deposited on a thermally oxidized Si substrate in a magnetron sputtering process.Nanoind......
ZnO films, doped with 2.9 atom% Cu, were prepared by radio frequency magnetron sputtering on sapphire substrate at diffe......
The radio frequency magnetron sputtering method is used to prepare well-dispersed pyramidal-shaped Ge nanoislands embedd......
The Shenguang-II Upgrade(SG-II Up) facility is an under-construction high-power laser driver with eight beams, 24 kJ ene......
In high-speed cutting, natural thermocouple, artificial thermocouple and infrared radiation temperature measurement are ......
The silicon-rich silica films were prepared by a dual-ion-beam co-sputtering method from a composite Target in an argon ......
The amorphous Ge2Sb2Te5 film with stoichiometric compositions was deposited by co-sputtering of separate Ge, Sb, and Te ......
This paper describes the design and fabrication of superconducting hot electron bolometer (HEB) mixer based on ultra-thi......
Stoichiometric and amorphous Er2O3 films were deposited on Si(001) substrates by radio frequency magnetron technique. Sp......
CrN coatings were deposited on Si(100) and piston rings by ion source assisted 40 kHz magnetron sputtering.Structure and......
Er2O3-Al2O3 film was deposited on the Si(001) substrate by radio frequency magnetron technique at room temperature.The s......
Mo thin films are deposited on soda lime glass (SLG) substrates using DC magnetron sputtering. The Mo film thicknesses a......
Sn/Cu/ZnS precursor were deposited by evaporation on soda lime glass at room temperature,and then polycrystalline thin f......
In this work, TeO_(0.7)thin films were prepared by the reactive magnetron-controlling sputtering method. Complex gray-sc......
The friction, wear and lubrication of carbon nitride coatings on silicon substrates are studied using a spherical diamon......
Sputter-deposited Au/Ni_(50)Fe_(50) bilayer films were annealed in a vacuum of 5×10~(-4) Pa at 523 to 723 K for 30 or 9......
Interface characteristic and mechanical performance of TiAl/Ti2AINb diffusion bonding joint with pur
Solid-state diffusion bonding(DB)of TiAl alloy and Ti2AlNb alloy was carried out using pure Ti as an interlayer at 1000 ......
The thin film of heat-sensitive materials has been widely conced with the current trend of miniaturization and integrati......
Crystalline TiO2 thin films were prepared by DC reactive magnetron sputtering on indium-tin oxide(ITO) thin film deposit......
该文从挂篮荷载计算、施工流程、支座及临时固结施工、挂篮安装及试验、合拢段施工、模板制作安装、钢筋安装、混凝土的浇筑及养生......
In this study, plasma nitriding was used to fabricate a hard protective layer on AISI P20 steel, at three process temper......
Optimization and Evaluation of Sputtering Barrier/Seed Layer in Through Silicon Via for 3-D Integrat
The barrier/seed layer is a key issue in Through Silicon Via(TSV) technology for 3-D integration.Sputtering is an import......
为探究吕家坨井田地质构造格局,根据钻孔勘探资料,采用分形理论和趋势面分析方法,研究了井田7......
This work studies the influence of anisothermal iron sintering process on hollow cathode discharge characteristics. Two ......
In research of YBCO coated conductors, the development of a oxide template for epitaxial growth of YBCO is very importan......
利用包括磁控溅射和热氧化的两步法在Si(111)衬底上制备了Sn掺杂ZnO纳米针.首先用磁控溅射法在Si(111)衬底上制备Sn:Zn薄膜,然后在......
Ternary Zn1-xCdx O alloying films were deposited on silicon substrates by a reactive magnetron sputtering method.The str......
Radiofrequent magnetron sputtering technique was used to produce calcium phosphate coated on the titanium substrates, an......
Characterization of DC magnetron sputtering deposited thin films of TiN for SBN/MgO/TiN/Si structura
Optimal parameters for depositing Titanium nitride (TiN) thin films by DC reactive magnetron sputtering were determined.......
Effect of Post Annealing on the Microstructure and Magnetic Properties of NdFeB/α-Fe/NdFeB Thin Film
A series of nanocomposite thin films, composed of Nd2Fe14B and α-Fe, has been prepared by DC-magnetron sputtering combi......
InP nanoparticles embedded in SiO2 thin films were prepared by radio-frequency magnetron co-sputtering. We analyzed the ......
Amorphous InGaZnO (a-IGZO) films were deposited on the corning eagle XG (EXG) glass substrates using magnetron sputterin......
An ambitious objective in the development of self-lubricating wear-resistant coatings is to make use of lubricious phase......
TiO2 films have been deposited on glass substrates using DC reactive magnetron sputtering at different oxygen partial pr......
采用射频磁控溅射方法在玻璃基板上制备了氧化锌(ZnO)薄膜样品,利用X射线衍射(XRD)表征和紫外-可见光透射光谱对其进行了表征,研究......
采用磁控溅射技术制备Pd／SnO2／SiO2／Si集成薄膜．研究退火处理对薄膜微观结构和表面形貌的影响，进而测试了相关的气敏性能．实验证明，经过氧......
透明导电氧化物（TCO）同时具有良好的金属导电性和较高的可见光透过率，近年来在光电器件领域，特别是平板显示和薄膜太阳能电池上得到广......
作者对于离子束轰击无限大非晶或多晶靶,基于材料的平移不变性(TIM),证明了能量和动量淀积深度分布函数的勒让德多项式展开系数必......
作者分别用 Sigmund理论和硬球模型求解了溅射输运方程 ,证明了硬球模型的优越性 ,从而大大地扩展了 Sigmund理论的适用范围 (E>10......
利用溅射技术制备了铁基多层纳米磁性薄膜，通过溅射参数的调整，可以精确地控制薄膜的厚度。然后对薄膜进行退火处理，使薄膜晶化。最后......
摘要： 非晶硅薄膜太阳能电池主要采用掺氟氧化锡（FTO）导电玻璃作为基板，但FTO薄膜雾度较低、表面形貌无法优化，导致无法得到较优的陷光......
观察了双层辉光渗金属过程中源极溅射后的成分以及形貌, 利用X射线衍射对源极溅射表面进行了相分析, 并且用Thermo-cale软件进行了......
在不同条件下用射频溅射方法制备了氮化碳薄膜. 薄膜的电子结构和元素成分用傅里叶变换红外光谱(FTIR)和光电子能谱(XPS)进行分析,......
